overlay residual
由 A Cohen 著作 · 2019 — A given litho layer intra-field overlay error includes several systematic sources, such as scanner lens-to-lens residuals and mask writer ... ,由 Y Sufrin 著作 · 2019 · 被引用 1 次 — A given litho layer intra-field overlay error includes several systematic sources, such as scanner lens-to-lens residuals and mask writer ... ,2018年11月15日 — Overlay是IC製造中的關鍵參數之，其意義是當層與前層圖案(pattern)間對準的精準度(圖1)。 各層元件之間的電路連結，例如從電晶體到接觸點到導電連接，都 ... ,由 CCK Huang 著作 · 被引用 2 次 — In addition to TMU, metrology engineers may also consider residual overlay error after removal of linear contributions such as translation, rotation and ... ,由 S Veeraraghaven 著作 · 被引用 7 次 — Keywords: overlay, residual stress, wafer shape. 1. INTRODUCTION. Controlling overlay errors in lithographic patterning is currently and will continue to be ... ,關鍵字：lithographic overlay、reticle、exposure grid map、high order ... (overlay)的量測來得到殘值(residual)的大小，此殘值指的是由於透鏡組的失真而導致. ,由 詹孟勳 著作 · 2011 — 並於找出最適當Mark之後，變更Run貨Recipe(程式)，實際下貨驗證，比較變更前後Overlay量測之殘值Residual (X & Y方向不可線性補償之覆蓋誤差)、X Mean + 3 sigma、Y ... ,關鍵字：疊對量測(Overlay measurement)，TIS(Tool Induce Shift)，WIS(Wafer Induce. Shift)，參考量測系統(Reference Measurement System-RMS).
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 overlay residual 相關參考資料
Enhanced wafer overlay residuals ... - SPIE Digital Library
由 A Cohen 著作 · 2019 — A given litho layer intra-field overlay error includes several systematic sources, such as scanner lens-to-lens residuals and mask writer ... https://www.spiedigitallibrary Enhanced wafer overlay residuals control: deep sub ...
由 Y Sufrin 著作 · 2019 · 被引用 1 次 — A given litho layer intra-field overlay error includes several systematic sources, such as scanner lens-to-lens residuals and mask writer ... https://www.spiedigitallibrary EUV微影和Overlay控制詳解 - 電子工程專輯
2018年11月15日 — Overlay是IC製造中的關鍵參數之，其意義是當層與前層圖案(pattern)間對準的精準度(圖1)。 各層元件之間的電路連結，例如從電晶體到接觸點到導電連接，都 ... https://www.eettaiwan.com Methodology for Overlay Mark Selection - YMS Magazine
由 CCK Huang 著作 · 被引用 2 次 — In addition to TMU, metrology engineers may also consider residual overlay error after removal of linear contributions such as translation, rotation and ... https://www.ymsmagazine.com Simulation of Non-Uniform Wafer Geometry and Thin Film ...
由 S Veeraraghaven 著作 · 被引用 7 次 — Keywords: overlay, residual stress, wafer shape. 1. INTRODUCTION. Controlling overlay errors in lithographic patterning is currently and will continue to be ... https://www.ymsmagazine.com 中華大學碩士論文
關鍵字：lithographic overlay、reticle、exposure grid map、high order ... (overlay)的量測來得到殘值(residual)的大小，此殘值指的是由於透鏡組的失真而導致. http://chur.chu.edu.tw 國立交通大學機構典藏：微影製程覆蓋誤差控制
由 詹孟勳 著作 · 2011 — 並於找出最適當Mark之後，變更Run貨Recipe(程式)，實際下貨驗證，比較變更前後Overlay量測之殘值Residual (X & Y方向不可線性補償之覆蓋誤差)、X Mean + 3 sigma、Y ... https://ir.nctu.edu.tw 疊對量測不確定度評估 - AOIEA - 工業技術研究院
關鍵字：疊對量測(Overlay measurement)，TIS(Tool Induce Shift)，WIS(Wafer Induce. Shift)，參考量測系統(Reference Measurement System-RMS). https://aoiea.itri.org.tw |