Photoresist hardening
2017年3月10日 — Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and ... ,由 B Li 著作 · 2017 · 被引用 13 次 — The CVD graphene was transferred following polymer assisted method and shaped by ion-milling rather than conventional oxygen plasma etching. A deep UV hardening ... ,For dry etching or electro- plating, in which vertical resist sidewalls must also remain vertical, a thermally more stable photoresist, such as the AZ® 701 MiR ... ,Photoresist is hardened by exposing it to UV radiation while subjecting it to elevated temperatures upon an increase in the degree of polymerization due to ... ,A plasma photoresist hardening technique is provided to improve the etch resistance of a photoresist mask 26. The technique involves the formation of a thin ... ,由 JS Chun 著作 · 1999 · 被引用 7 次 — Among various ion species, it is found that Argon ion did not affect the photoresist thickness and critical dimension after ion implantation. Much improved ... ,由 CS Huang 著作 · 1999 · 被引用 29 次 — ... and footing during UV-bake DUV photoresist hardening process has been developed. After this UV baking process, a higher etch selectivity to photoresist, ... ,A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface ... ,Photoresist is hardened by exposing it to UV radiation while subjecting it to elevated temperatures upon an increase in the degree of polymerization due to ... ,A plasma photoresist hardening technique is provided to improve the etch resistance of a photoresist mask 26 . The technique involves the formation of a ...
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 Photoresist hardening 相關參考資料
(PDF) Deep UV hardening of photoresist for shaping of ...
2017年3月10日 — Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and ... https://www.researchgate.net Deep UV hardening of photoresist for shaping of graphene ...
由 B Li 著作 · 2017 · 被引用 13 次 — The CVD graphene was transferred following polymer assisted method and shaped by ion-milling rather than conventional oxygen plasma etching. A deep UV hardening ... https://www.sciencedirect.com Hardbake, reflow and DUV Hardening - MicroChemicals
For dry etching or electro- plating, in which vertical resist sidewalls must also remain vertical, a thermally more stable photoresist, such as the AZ® 701 MiR ... https://www.microchemicals.com Hardening of photoresist - 한국과학기술정보연구원
Photoresist is hardened by exposing it to UV radiation while subjecting it to elevated temperatures upon an increase in the degree of polymerization due to ... https://scienceon.kisti.re.kr Method for plasma hardening photoresist in etching of ...
A plasma photoresist hardening technique is provided to improve the etch resistance of a photoresist mask 26. The technique involves the formation of a thin ... https://scienceon.kisti.re.kr Novel hardening methods of DUV chemically amplified ...
由 JS Chun 著作 · 1999 · 被引用 7 次 — Among various ion species, it is found that Argon ion did not affect the photoresist thickness and critical dimension after ion implantation. Much improved ... https://www.spiedigitallibrary Novel UV baking process to improve DUV photoresist hardness
由 CS Huang 著作 · 1999 · 被引用 29 次 — ... and footing during UV-bake DUV photoresist hardening process has been developed. After this UV baking process, a higher etch selectivity to photoresist, ... https://scholar.nycu.edu.tw Photoresist - Wikipedia
A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface ... https://en.wikipedia.org US4548688A - Hardening of photoresist - Google Patents
Photoresist is hardened by exposing it to UV radiation while subjecting it to elevated temperatures upon an increase in the degree of polymerization due to ... https://patents.google.com US6660646B1 - Method for plasma hardening photoresist in ...
A plasma photoresist hardening technique is provided to improve the etch resistance of a photoresist mask 26 . The technique involves the formation of a ... https://patents.google.com |