Metal dry etching
Dry etching is usually an anisotropic process in which the momentum of ion species accelerating towards the substrate in combination with a masking process ... ,Dry etching is currently used in semiconductor fabrication processes due to its unique ability over wet etch to do anisotropic etching (removal of material) to ... ,由 DP Kim 著作 · 2009 · 被引用 10 次 — Dry-etching properties of TiN for metal/high-k gate stack using BCl3-based inductively coupled plasma. Journal of Vacuum Science & Technology A 27, ... ,Dry” (plasma) etching is used for circuit-defining steps; “wet” etching (using chemical baths) is used mainly to clean wafers. Applied also offers an ... ,Metal Etching. Plasma does an excellent job of removing organic contaminants and activating the surface of most metals. Plasma is generally not considered a ... ,The Etching of Si and its Compounds ... It's a 6” ICP tool for etching of silicon, oxide, nitrite, III-V, polymers, and some metals! ,由 H Ohmi 著作 · 2019 · 被引用 2 次 — metal.4−6 One of the motivations for performing dry etching processes using chlorine-related gases is to achieve anisotropic.
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 Metal dry etching 相關參考資料
Dry Etching - an overview | ScienceDirect Topics
Dry etching is usually an anisotropic process in which the momentum of ion species accelerating towards the substrate in combination with a masking process ... https://www.sciencedirect.com Dry etching - Wikipedia
Dry etching is currently used in semiconductor fabrication processes due to its unique ability over wet etch to do anisotropic etching (removal of material) to ... https://en.wikipedia.org Dry-etching properties of TiN for metalhigh-k gate stack using ...
由 DP Kim 著作 · 2009 · 被引用 10 次 — Dry-etching properties of TiN for metal/high-k gate stack using BCl3-based inductively coupled plasma. Journal of Vacuum Science & Technology A 27, ... https://avs.scitation.org Etch | Applied Materials
Dry” (plasma) etching is used for circuit-defining steps; “wet” etching (using chemical baths) is used mainly to clean wafers. Applied also offers an ... https://www.appliedmaterials.c Plasma Dry Etching | Plasma Etch, Inc.
Metal Etching. Plasma does an excellent job of removing organic contaminants and activating the surface of most metals. Plasma is generally not considered a ... https://www.plasmaetch.com PLASMA RIE ETCHING FUNDAMENTALS AND ...
The Etching of Si and its Compounds ... It's a 6” ICP tool for etching of silicon, oxide, nitrite, III-V, polymers, and some metals! https://purdue.edu Significant Improvement of Copper Dry Etching Property of a ...
由 H Ohmi 著作 · 2019 · 被引用 2 次 — metal.4−6 One of the motivations for performing dry etching processes using chlorine-related gases is to achieve anisotropic. https://pubs.acs.org |