transformer coupled plasma
An inductively coupled plasma (ICP) or transformer coupled plasma (TCP) is a type of plasma source in which ... , ,由 MV Malyshev 著作 · 1999 · 被引用 36 次 — Langmuir probe studies of a transformer-coupled plasma, aluminum etcher. Journal of Vacuum Science & Technology A 17, 480 (1999); https://doi.org/10.1116/ ... ,由 CY Lee 著作 · 2015 · 被引用 2 次 — Plasma is used to application with wide range which used the structure of transformer coupling plasma. (TCP) to generate and keep the plasma ... ,由 JB Carter 著作 · 1993 · 被引用 92 次 — A transformer coupled plasma (TCP) source has been integrated into a production tool and characterized for subhalf micron etching of thin films. ,由 JP Holland 著作 · 1993 — A transformer coupled plasma (TCP) source has been developed for use in the etching of polysilicon films. The TCP is a planar, inductive source which can ... ,由 廖木生 著作 · 2004 · 被引用 1 次 — Wafer to wafer control of etching rate in Transformer. Coupled Plasma Processing Equipment ... 耦合式電漿源（Transformer Coupled Plasma，TCP ）比較兩著的優. ,感應耦合電漿（英語：Inductively Coupled Plasma，縮寫：ICP）是一種通過隨時間變化的磁場電磁感應產生電流作為能量來源的電漿體源。 ,由 李介民 著作 · 2003 — The Transformer-Coupled-Plasma is one of the most important and commonly used etching equipment in chip foundry today. In this research, we employ.
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 transformer coupled plasma 相關參考資料
Inductively Coupled Plasma (ICP) - YouTube
An inductively coupled plasma (ICP) or transformer coupled plasma (TCP) is a type of plasma source in which ... https://www.youtube.com Inductively coupled plasma - Wikipedia
https://en.wikipedia.org Langmuir probe studies of a transformer-coupled plasma ...
由 MV Malyshev 著作 · 1999 · 被引用 36 次 — Langmuir probe studies of a transformer-coupled plasma, aluminum etcher. Journal of Vacuum Science & Technology A 17, 480 (1999); https://doi.org/10.1116/ .... https://avs.scitation.org Low Pressure Plasma Voltage Process for Transformer ...
由 CY Lee 著作 · 2015 · 被引用 2 次 — Plasma is used to application with wide range which used the structure of transformer coupling plasma. (TCP) to generate and keep the plasma ... http://www.electrochemsci.org Transformer coupled plasma etch technology for the ...
由 JB Carter 著作 · 1993 · 被引用 92 次 — A transformer coupled plasma (TCP) source has been integrated into a production tool and characterized for subhalf micron etching of thin films. https://avs.scitation.org Transformer-coupled plasma technology for sub-half-micron ...
由 JP Holland 著作 · 1993 — A transformer coupled plasma (TCP) source has been developed for use in the etching of polysilicon films. The TCP is a planar, inductive source which can ... https://www.spiedigitallibrary 國立交通大學機械工程研究所碩士論文
由 廖木生 著作 · 2004 · 被引用 1 次 — Wafer to wafer control of etching rate in Transformer. Coupled Plasma Processing Equipment ... 耦合式電漿源（Transformer Coupled Plasma，TCP ）比較兩著的優. https://ir.nctu.edu.tw 感應耦合電漿- 維基百科，自由的百科全書
感應耦合電漿（英語：Inductively Coupled Plasma，縮寫：ICP）是一種通過隨時間變化的磁場電磁感應產生電流作為能量來源的電漿體源。 https://zh.wikipedia.org 變壓耦合式電漿二維流體模型與批次電漿蝕刻設備控制Two ...
由 李介民 著作 · 2003 — The Transformer-Coupled-Plasma is one of the most important and commonly used etching equipment in chip foundry today. In this research, we employ. https://ir.nctu.edu.tw |