icp etcher
The Unaxis Shuttleline inductively coupled plasma (ICP) etcher is a general purpose chlorine reactive ion etcher. The high power ICP source combined with low ... ,The PlasmaPro 100 Cobra ICP RIE utilises high-density plasma to achieve fast etching and deposition rates. The process modules offer excellent uniformity, ... ,反應離子蝕刻（英文：Reactive-Ion Etching，或簡寫為RIE）是一種半導體生產加工工藝，它利用由電漿體強化後的反應離子氣體轟擊目標材料，來達到刻蝕的目的。,Samco offers multiple ICP plasma etching (ICP-RIE) systems to meet each customer's process needs for plasma etching. Our ICP plasma etching systems are able to ... ,(Inductive Couple Plasma Etcher, ICP Etcher). 儀器簡介. 感應耦合式電漿蝕刻系統是採用射頻電源注入設計在腔體周圍的電極線圈，藉由電感耦. 合增加電子的運動距離而在 ... ,ICP-RIE can be used for rapid etching of a wide range of materials, including semiconductors, dielectrics, metals, and polymers. The available processes span ... ,ICP RIE etching is an advanced technique designed to deliver high etch rates, high selectivity and low damage processing. Excellent profile control is also ... ,採用電感偶合式電漿(inductively coupled plasma)放電模式的ICP電漿蝕刻系統. 具備真空晶圓裝卸(cassette)室. 提供給多種材料的超精緻高速製程. 搭載獨特旋渦線圈電極, ... ,ICP Etcher 感應耦合式電漿蝕刻系統. 標準作業程序. 一、 機台部位基本簡介. 二、 作業內容：. 主操作畫面. 製程腔體. L/UL 腔體. 操作電腦. 冷卻水機. 電源箱. 氣體箱. ,BMR ICP Etcher是一種創新的蝕刻解決方案,為薄膜生產提供高精度和精確度,並利用感應耦合等離子體（ICP）技術和自動調諧系統來定制工藝參數。
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 icp etcher 相關參考資料
Unaxis Shuttleline Inductively Coupled Plasma (ICP) Etcher
The Unaxis Shuttleline inductively coupled plasma (ICP) etcher is a general purpose chlorine reactive ion etcher. The high power ICP source combined with low ... https://www.nist.gov PlasmaPro 100 Cobra ICP Etching System
The PlasmaPro 100 Cobra ICP RIE utilises high-density plasma to achieve fast etching and deposition rates. The process modules offer excellent uniformity, ... https://plasma.oxinst.com 反應離子刻蝕- 維基百科，自由的百科全書
反應離子蝕刻（英文：Reactive-Ion Etching，或簡寫為RIE）是一種半導體生產加工工藝，它利用由電漿體強化後的反應離子氣體轟擊目標材料，來達到刻蝕的目的。 https://zh.wikipedia.org ICP Etch Systems
Samco offers multiple ICP plasma etching (ICP-RIE) systems to meet each customer's process needs for plasma etching. Our ICP plasma etching systems are able to ... https://www.samcointl.com 感應耦合式電漿蝕刻系統
(Inductive Couple Plasma Etcher, ICP Etcher). 儀器簡介. 感應耦合式電漿蝕刻系統是採用射頻電源注入設計在腔體周圍的電極線圈，藉由電感耦. 合增加電子的運動距離而在 ... https://www.tsri.org.tw Reactive Ion Etching (ICP-RIE ) - Corial - Plasma-Therm
ICP-RIE can be used for rapid etching of a wide range of materials, including semiconductors, dielectrics, metals, and polymers. The available processes span ... https://corial.plasmatherm.com Inductively Coupled Plasma Etching (ICP RIE)
ICP RIE etching is an advanced technique designed to deliver high etch rates, high selectivity and low damage processing. Excellent profile control is also ... https://plasma.oxinst.com 產品感應耦合式電漿蝕刻(ICP-RIE)系統RIE-230iPC
採用電感偶合式電漿(inductively coupled plasma)放電模式的ICP電漿蝕刻系統. 具備真空晶圓裝卸(cassette)室. 提供給多種材料的超精緻高速製程. 搭載獨特旋渦線圈電極, ... http://www.samco.co.jp ICP Etcher 感應耦合式電漿蝕刻系統標準作業程序
ICP Etcher 感應耦合式電漿蝕刻系統. 標準作業程序. 一、 機台部位基本簡介. 二、 作業內容：. 主操作畫面. 製程腔體. L/UL 腔體. 操作電腦. 冷卻水機. 電源箱. 氣體箱. https://www.tsri.org.tw 二手BMR ICP Etcher #9209714 待售
BMR ICP Etcher是一種創新的蝕刻解決方案,為薄膜生產提供高精度和精確度,並利用感應耦合等離子體（ICP）技術和自動調諧系統來定制工藝參數。 https://tw.caeonline.com |