hydra etch
2019年3月20日 — In this report, across-wafer CDU improvement by etch tool correction using the Hydra uniformity system in an advance Lam Research etch tool ... ,chamber was equipped with a Hydra ® Uniformity System to achieve atomic scale fidelity of critical dimensions and with Advanced Mixed Mode Pulsing (AMMP ™ ) ... ,2015年7月13日 — Lam Research Ships 200th Kiyo® Conductor Etch Module with Proprietary Hydra® Technology. Milestone showcases expanding leadership in ... ,Atomic Layer Etch (ALE) Reactive Ion Etch ... 採用可修正輸入圖案變異性的專屬Hydra®技術，能提升關鍵尺寸(CD)的均勻度; 透過電漿輔助原子層蝕刻(ALE)技術， ... ,2015年7月13日 — As part of Lam's market-leading Kiyo conductor etch family, Kiyo with Hydra technology addresses these challenges while delivering ... ,2014年7月7日 — Lam's 2300® Kiyo® F Series conductor etch system uses a breakthrough technology -- the Hydra™ Uniformity System -- to enable cross-wafer ... ,2017年8月7日 — In all plasma etch reactors, the abrupt end of the wafer surface creates ... The new capability provided by Corvus complements Lam's Hydra ... ,The Hydra based etch planarization technology can also be extended to other process as ILD etch back with suitable etch process. This technology will be very ... ,metal line undercut caused by post-etch cleaning may lead to a high via resistance ... 2.1.2 乾式蝕刻(Dry Etching)製程：. ... Hydra/Medusa Chemical Equilibrium. ,Etch processes are referred to as conductor etch, dielectric etch, or polysilicon ... For example, dielectric etch is involved when an oxide layer is etched to leave ...
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 hydra etch 相關參考資料
Across-wafer sub-1 nm critical dimension uniformity control by ...
2019年3月20日 — In this report, across-wafer CDU improvement by etch tool correction using the Hydra uniformity system in an advance Lam Research etch tool ... https://www.spiedigitallibrary CD variations before etch and after etching with the Hydra ...
chamber was equipped with a Hydra ® Uniformity System to achieve atomic scale fidelity of critical dimensions and with Advanced Mixed Mode Pulsing (AMMP ™ ) ... https://www.researchgate.net Etch Milestone Highlights Advanced Variability Control | Lam ...
2015年7月13日 — Lam Research Ships 200th Kiyo® Conductor Etch Module with Proprietary Hydra® Technology. Milestone showcases expanding leadership in ... https://blog.lamresearch.com KIYO系列產品- Lam Research
Atomic Layer Etch (ALE) Reactive Ion Etch ... 採用可修正輸入圖案變異性的專屬Hydra®技術，能提升關鍵尺寸(CD)的均勻度; 透過電漿輔助原子層蝕刻(ALE)技術， ... https://www.lamresearch.com Lam Research Ships 200th Kiyo(R) Conductor Etch Module ...
2015年7月13日 — As part of Lam's market-leading Kiyo conductor etch family, Kiyo with Hydra technology addresses these challenges while delivering ... https://investor.lamresearch.c Lam's New Etch and Deposition Products Control Process ...
2014年7月7日 — Lam's 2300® Kiyo® F Series conductor etch system uses a breakthrough technology -- the Hydra™ Uniformity System -- to enable cross-wafer ... https://investor.lamresearch.c New Corvus Technology Takes Uniformity Control to the Edge ...
2017年8月7日 — In all plasma etch reactors, the abrupt end of the wafer surface creates ... The new capability provided by Corvus complements Lam's Hydra ... https://blog.lamresearch.com Poly-Si Planarization by ICP Plasma Etch at ... - IOPscience
The Hydra based etch planarization technology can also be extended to other process as ILD etch back with suitable etch process. This technology will be very ... https://iopscience.iop.org 國立交通大學機構典藏- 交通大學
metal line undercut caused by post-etch cleaning may lead to a high via resistance ... 2.1.2 乾式蝕刻(Dry Etching)製程：. ... Hydra/Medusa Chemical Equilibrium. https://ir.nctu.edu.tw 蝕刻| Applied Materials
Etch processes are referred to as conductor etch, dielectric etch, or polysilicon ... For example, dielectric etch is involved when an oxide layer is etched to leave ... https://www.appliedmaterials.c |