OPC reticle
For our evaluation, an OPC test reticle was designed, and fabricated with E-beam and dry-etching. Base patterns are 0.18 micrometer-rule memory cells. , "Until now, photomask and IC manufacturers whose reticles used OPC and PSM technologies have had to make a tradeoff between the risk of ...,By examining the results of these algorithms, their ability to inspect OPC reticle patterns can be compared. Part of the test criteria includes examining the number ... ,Current manufacturing techniques for advanced wafers require reticle patterns to contain a variety of OPC structures. These structures include several types and ... ,Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process ... ,must be carefully modeled to exactly match the reticle pattern. Further, sub-resolution. OPC shapes are often at the limit of the mask manufacturing process, ... ,When an OPC model is generated the reticle and wafer processing errors are merged, quantified, and fit to a theoretical model. The effectiveness of the OPC ... , 在檢測方面，複雜的OPC產生大量實際存在但對於微影無關緊要的缺陷。光罩檢測面臨的挑戰是要處理大量「干擾」缺陷，同時還不能遺漏每一個在微影 ...
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 OPC reticle 相關參考資料
Inspection of OPC reticle for 0.18-um-rule devices
For our evaluation, an OPC test reticle was designed, and fabricated with E-beam and dry-etching. Base patterns are 0.18 micrometer-rule memory cells. https://www.spiedigitallibrary KLA-Tencor's New Reticle Inspection Tools Extend Sub ...
"Until now, photomask and IC manufacturers whose reticles used OPC and PSM technologies have had to make a tradeoff between the risk of ... http://ir.kla-tencor.com OPC reticle inspection techniques - ResearchGate
By examining the results of these algorithms, their ability to inspect OPC reticle patterns can be compared. Part of the test criteria includes examining the number ... https://www.researchgate.net OPC reticle inspection techniques - SPIE Digital Library
Current manufacturing techniques for advanced wafers require reticle patterns to contain a variety of OPC structures. These structures include several types and ... https://www.spiedigitallibrary Optical proximity correction - Wikipedia
Optical proximity correction (OPC) is a photolithography enhancement technique commonly used to compensate for image errors due to diffraction or process ... https://en.wikipedia.org Photomask - SPIE
must be carefully modeled to exactly match the reticle pattern. Further, sub-resolution. OPC shapes are often at the limit of the mask manufacturing process, ... https://spie.org Reticle process effects on OPC models - SPIE Digital Library
When an OPC model is generated the reticle and wafer processing errors are merged, quantified, and fit to a theoretical model. The effectiveness of the OPC ... https://www.spiedigitallibrary 因應10奈米以下製程光罩檢測挑戰- 電子工程專輯
在檢測方面，複雜的OPC產生大量實際存在但對於微影無關緊要的缺陷。光罩檢測面臨的挑戰是要處理大量「干擾」缺陷，同時還不能遺漏每一個在微影 ... https://www.eettaiwan.com |