Critical dimension uniformity
2016年4月18日 — This paper presents a novel approach to improve across-wafer gate CD uniformity through the lithography and etch process sequence. The proposed ... ,由 C Lee 著作 · 2019 · 被引用 1 次 — As process technology progresses beyond the 7 nm node, the critical dimension uniformity (CDU) requirement is now in the sub-1 nm regime due ... ,由 H Teyssedre 著作 · 2016 · 被引用 6 次 — The Critical Dimension Uniformity (CDU) analysis is a first step in the assessment chain of a nano-patterning process: it reveals the disparity ... ,由 GF Lorusso 著作 · 2015 · 被引用 12 次 — Contact Hole (CH) Local Critical Dimension Uniformity (LCDU) has a direct impact on device performance. As a consequence, being able to ... , ,由 MC Lin 著作 · 2012 — This paper studies the repeatability and the reliability of CDUs from a mask inspector and their correlation with CD SEM measurements on ... ,由 M Kubis 著作 · 2016 · 被引用 5 次 — Optimizing inter- and intra-field CD uniformity of the final pattern requires a holistic tuning of all process steps. ,由 黃閔顯 著作 · 2006 · 被引用 1 次 — Optimization of Critical Dimension (CD) Measurement Metrology. 研究生: 黃閔顯 ... 不量shot 中心點，故無法監控鏡片均勻性(Lens Uniformity)，且量測8 點將.
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 Critical dimension uniformity 相關參考資料
(PDF) Across Wafer Critical Dimension Uniformity ...
2016年4月18日 — This paper presents a novel approach to improve across-wafer gate CD uniformity through the lithography and etch process sequence. The proposed ... https://www.researchgate.net Across-wafer sub-1 nm critical dimension uniformity control by ...
由 C Lee 著作 · 2019 · 被引用 1 次 — As process technology progresses beyond the 7 nm node, the critical dimension uniformity (CDU) requirement is now in the sub-1 nm regime due ... https://www.spiedigitallibrary Critical dimension uniformity characterization of ...
由 H Teyssedre 著作 · 2016 · 被引用 6 次 — The Critical Dimension Uniformity (CDU) analysis is a first step in the assessment chain of a nano-patterning process: it reveals the disparity ... https://www.spiedigitallibrary Influence of etch process on contact hole local critical ...
由 GF Lorusso 著作 · 2015 · 被引用 12 次 — Contact Hole (CH) Local Critical Dimension Uniformity (LCDU) has a direct impact on device performance. As a consequence, being able to ... https://www.spiedigitallibrary Photomask October 2012 - SPIE
https://spie.org Study of critical dimension uniformity (CDU) using a mask ...
由 MC Lin 著作 · 2012 — This paper studies the repeatability and the reliability of CDUs from a mask inspector and their correlation with CD SEM measurements on ... https://www.spiedigitallibrary Ultimate intra-wafer critical dimension ... - SPIE Digital Library
由 M Kubis 著作 · 2016 · 被引用 5 次 — Optimizing inter- and intra-field CD uniformity of the final pattern requires a holistic tuning of all process steps. https://www.spiedigitallibrary 工學院專班半導體材料與製程設備學程
由 黃閔顯 著作 · 2006 · 被引用 1 次 — Optimization of Critical Dimension (CD) Measurement Metrology. 研究生: 黃閔顯 ... 不量shot 中心點，故無法監控鏡片均勻性(Lens Uniformity)，且量測8 點將. https://ir.nctu.edu.tw |