Carbon dry etch
PDF | The C layers have been patterned by dry etching. The etch characteristics of this material in various etch gases were examined. The carbon. ,由 KA Pears 著作 · 2005 · 被引用 19 次 — Patterning carbon hard mask stacks for sub 90 nm technologies was tested for three different O2-based chemistries using an inductively coupled plasma etch ... ,The C layers have been patterned by dry etching. The etch characteristics of this material in various etch gases were examined. The carbon structures with ... ,由 S Haščı́k 著作 · 2000 · 被引用 6 次 — The C layers have been patterned by dry etching. The etch characteristics of this material in various etch gases were examined. The carbon structures with ... ,由 Š Haščı́k 著作 · 2000 · 被引用 6 次 — We present patterning by dry etching of carbon layers, which were prepared by direct sputtering, in various etch gases (H2, N2, Ar, O2 and freons). Reactive ion ... ,Request PDF | Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide | Carbonyl sulfide (COS) was added to ... ,由 JK Kim 著作 · 2013 · 被引用 27 次 — Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide. Journal of Vacuum Science & Technology A 31, ... ,2021年1月28日 — To improve the durability of an etch hard mask, an understanding of the plasma deposition mechanisms and the deposited film properties ...
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(PDF) Dry etching of carbon layers in various etch gases
PDF | The C layers have been patterned by dry etching. The etch characteristics of this material in various etch gases were examined. The carbon. https://www.researchgate.net Carbon etching with a high density plasma etcher
由 KA Pears 著作 · 2005 · 被引用 19 次 — Patterning carbon hard mask stacks for sub 90 nm technologies was tested for three different O2-based chemistries using an inductively coupled plasma etch ... https://www.sciencedirect.com Dry etching of carbon layers in various etch gases
The C layers have been patterned by dry etching. The etch characteristics of this material in various etch gases were examined. The carbon structures with ... https://kundoc.com Dry etching of carbon layers in various etch gases - INFONA
由 S Haščı́k 著作 · 2000 · 被引用 6 次 — The C layers have been patterned by dry etching. The etch characteristics of this material in various etch gases were examined. The carbon structures with ... https://www.infona.pl Dry etching of carbon layers in various etch gases - Science ...
由 Š Haščı́k 著作 · 2000 · 被引用 6 次 — We present patterning by dry etching of carbon layers, which were prepared by direct sputtering, in various etch gases (H2, N2, Ar, O2 and freons). Reactive ion ..... https://www.sciencedirect.com Study on the etching characteristics of ... - ResearchGate
Request PDF | Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide | Carbonyl sulfide (COS) was added to ... https://www.researchgate.net Study on the etching characteristics of amorphous carbon ...
由 JK Kim 著作 · 2013 · 被引用 27 次 — Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide. Journal of Vacuum Science & Technology A 31, ... https://avs.scitation.org Surface Analysis of Amorphous Carbon Thin Film for Etch ...
2021年1月28日 — To improve the durability of an etch hard mask, an understanding of the plasma deposition mechanisms and the deposited film properties ... https://www.researchgate.net |