scatterometry critical dimension
由 M Wurm 著作 · 2010 · 被引用 47 次 — At Physikalisch-Technische Bundesanstalt, the National Metrology Institute of Germany, a new type of deep ultraviolet scatterometer has been developed and ... ,由 M Wurm 著作 · 2010 · 被引用 47 次 — The concept of the system is very variable and versatile, so that many different types of measurements, e.g., classical scatterometry, ellipsometric ... ,Request PDF | Evaluation of scatterometry tools for critical dimension metrology | Scatterometry as a non-imaging metrology method offers access to the ... ,由 HJ Patrick 著作 · 被引用 5 次 — We use an optical critical dimension (OCD) technique, matching modeled to measured scatterometry signatures, to obtain critical dimension linewidth of lines ... ,2017年3月22日 — CD Metrology for Advanced Lithography. 22.03.2017. Critical Dimension CD: structure widths / size. ⇒ OCD (Scatterometry) and extensions. ,Even though these sizes are much smaller than the wavelength of the light that is used, optical scatterometry with sophisticated methods enable to cover this ... ,由 YH Huang 著作 · 2011 · 被引用 6 次 — For these structures, the critical measurement parameters include side wall angle (SWA) and critical dimension (CD). For production process ... ,由 R Chalykh 著作 · 2006 · 被引用 7 次 — Scatterometry provides fast and nondestructive method of profile and CD measurements. In this paper the conditions of determining of profile and CD measurement ...
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 scatterometry critical dimension 相關參考資料
A new flexible scatterometer for critical dimension ... - PubMed
由 M Wurm 著作 · 2010 · 被引用 47 次 — At Physikalisch-Technische Bundesanstalt, the National Metrology Institute of Germany, a new type of deep ultraviolet scatterometer has been developed and ... https://pubmed.ncbi.nlm.nih.go A new flexible scatterometer for critical dimension metrology
由 M Wurm 著作 · 2010 · 被引用 47 次 — The concept of the system is very variable and versatile, so that many different types of measurements, e.g., classical scatterometry, ellipsometric ... https://aip.scitation.org Evaluation of scatterometry tools for critical dimension metrology
Request PDF | Evaluation of scatterometry tools for critical dimension metrology | Scatterometry as a non-imaging metrology method offers access to the ... https://www.researchgate.net Modeling and Analysis of Scatterometry Signatures for Optical ...
由 HJ Patrick 著作 · 被引用 5 次 — We use an optical critical dimension (OCD) technique, matching modeled to measured scatterometry signatures, to obtain critical dimension linewidth of lines ... https://tsapps.nist.gov OCD Metrology for Advanced Lithography - NIST
2017年3月22日 — CD Metrology for Advanced Lithography. 22.03.2017. Critical Dimension CD: structure widths / size. ⇒ OCD (Scatterometry) and extensions. https://www.nist.gov Optical Scatterometry - Optical Critical ... - Nova
Even though these sizes are much smaller than the wavelength of the light that is used, optical scatterometry with sophisticated methods enable to cover this ... https://www.novami.com Scatterometry measurement for gate ADI and AEI critical ...
由 YH Huang 著作 · 2011 · 被引用 6 次 — For these structures, the critical measurement parameters include side wall angle (SWA) and critical dimension (CD). For production process ... https://www.spiedigitallibrary Simulation of critical dimension and profile metrology based ...
由 R Chalykh 著作 · 2006 · 被引用 7 次 — Scatterometry provides fast and nondestructive method of profile and CD measurements. In this paper the conditions of determining of profile and CD measurement ... https://www.spiedigitallibrary |