ekc clean
2, no differense is obserbed in top down SEM images between. Ti/TiN bilayer local interconnect using EKC solvent clean, and using plasma treatment plus DI rinse ... ,DuPont™ EKC™575 post etch residue remover is an aqueous cleaning solution designed specifically to address TiN metal hard mask pullback in situ during ... ,It is a highly selective post metal and via etch residue remover based on EKC's proprietary HDA® high performance hydroxylamine-based cleaning technology ... ,Our EKC Technology products provide best-in-class process solutions for wafer cleaning, surface preparations, liquid and dry film resist removal, post CMP ... ,DuPont's EKC positive and negative photoresist removers are organic materials specifically formulated to clean substrate surfaces after patterning. ,DuPont's EKC post-clean treatments are formulated for use after post etch residue or photoresist removal and prior to the DI water rinse step. ,DuPont™ EKC™ PCMP5600 Series is a high volume, post-CMP copper interconnect cleaner required in the manufacturing of advanced semiconductor devices. ,It is also used to clean HBr-etched polysilicon and is able to remove residues after metal etch. EKC265™ EKC265™ was the initial product in the PlasmaSolv® ... ,Introduction. Spray solvent tools are used in the post etch residual polymer removal process to clean the surface of wafers. EKC is a commonly used chemical in.
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 ekc clean 相關參考資料
A Novel Post Etch Cleaning Process to Prevent Titanium ...
2, no differense is obserbed in top down SEM images between. Ti/TiN bilayer local interconnect using EKC solvent clean, and using plasma treatment plus DI rinse ... https://www.electrochem.org DuPont™ CuSolve™ EKC™575
DuPont™ EKC™575 post etch residue remover is an aqueous cleaning solution designed specifically to address TiN metal hard mask pullback in situ during ... https://www.dupont.com DuPont™ PlasmaSolv® EKC265™
It is a highly selective post metal and via etch residue remover based on EKC's proprietary HDA® high performance hydroxylamine-based cleaning technology ... https://www.dupont.com EKC Photoresist & Residue Removers - DuPont
Our EKC Technology products provide best-in-class process solutions for wafer cleaning, surface preparations, liquid and dry film resist removal, post CMP ... https://www.dupont.com EKC Positive and Negative Photoresist Removers | DuPont
DuPont's EKC positive and negative photoresist removers are organic materials specifically formulated to clean substrate surfaces after patterning. https://www.dupont.com EKC Post-Clean Treatments | DuPont
DuPont's EKC post-clean treatments are formulated for use after post etch residue or photoresist removal and prior to the DI water rinse step. https://www.dupont.com EKC Post-CMP Cleaners | DuPont
DuPont™ EKC™ PCMP5600 Series is a high volume, post-CMP copper interconnect cleaner required in the manufacturing of advanced semiconductor devices. https://www.dupont.com EKC Post-etch Residue Removers | DuPont
It is also used to clean HBr-etched polysilicon and is able to remove residues after metal etch. EKC265™ EKC265™ was the initial product in the PlasmaSolv® ... https://www.dupont.com polymer residue remover, ekc - K-Patents
Introduction. Spray solvent tools are used in the post etch residual polymer removal process to clean the surface of wafers. EKC is a commonly used chemical in. http://www.kpatents.com |